Core and semiconductor on-chip passive electromagnetic field simulation kits successfully passed Samsung 8LPP process certification

Core and semiconductor on-chip passive electromagnetic field simulation kits successfully passed Samsung 8LPP process certification

    On May 14, 2021, China's EDA industry leader, Chip and Semiconductor Technology (Shanghai) Co., Ltd. announced that its on-chip passive electromagnetic field (EM) simulation kit has successfully passed the 8 nm Low Power (8LPP) process technology certification from Samsung fabs. The suite includes a fast 3D EMF emulator (IRIS) and a fast automated PDK modeling tool (Imodeler). This certification will significantly speed up IC Design's design delivery on the 8LPP process.

　Samsung's 8LPP fabs are further optimized for power, performance, and area on the basis of their previous generation of advanced FinFET nodes. For applications such as mobile, networking, server, automotive and cryptocurrency, 8LPP offers distinct advantages and is considered one of the most attractive process nodes in a wide range of high-performance applications.
“With the increasing complexity of advanced process node design, accurate EM simulation is critical for our customers to achieve the success of disposable chip design streamers." Jongwook Kye, vice president of the Design Enablement team at Samsung Electronics, said: "The successful certification of the 3D full-wave EM kits for both cores and semiconductors will create enough confidence for our mutual customers when creating models and running EM simulations."
　"We are very pleased that IRIS was able to achieve a high degree of match between the simulation and the test data, resulting in the Samsung 8LPP process certification," said Dr. Ling Feng, CEO of Chip and Semiconductor. As a member of the Samsung Advanced Foundry Ecosystem (SAFE) program, Semiconductor and Semiconductor will continue to work closely with Samsung on a variety of process technologies to provide innovative solutions and services to our mutual customers.

　Using state-of-the-art EM simulation technology tailored for advanced process nodes, IRIS provides accurate full-wave algorithms from DC to THz and accelerates simulation efficiency through multi-core parallel computing and distributed processing. IRIS is widely used by design companies because it has a number of specific features for matching advanced process nodes, including the ability to consider line widths and line spacing deviations during machining. Imodeler automatically generates PDKs with built-in rich templates and a fast IRIS simulation engine. It helps PDK engineers and circuit design engineers quickly generate parametric models.